Longreads
CMOS Process Steps: 3um to 1.25um
CMOS chips are made using a twin-well process, with precise tailoring of each well starting from a lightly doped substrate. Key production ...
Basic nMOS Technology: Process Steps
NMOS fabrication involves key process steps like substrate selection, isolation, gate formation, and metallization. LOCOS isolation prevents unwanted current flow, while polysilicon ...
The Physics and Technology of Extrinsic Semiconductors
Doping modifies a semiconductor by introducing donor or acceptor atoms, increasing free electron or hole concentration. This creates an n-type or p-type ...
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The Physics and Technology of Extrinsic Semiconductors
Doping modifies a semiconductor by introducing donor or acceptor atoms, increasing free electron or hole concentration. This creates an n-type or p-type material, shifting the Fermi level closer ...
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